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2-Oxotetrahydrofuran-3-yl Methacrylate

CAS195000-66-9

MF

Purity99%

ClassificationPhotoresist - Acrylate Monomers
2-Methyl-2-adamantyl methacrylate

CAS177080-67-0

MF

Purity99%

ClassificationPhotoresist - Acrylate Monomers
2-Oxo-6-hydro-2H-3,5-methylcyclopenta[b]furan-6-methacrylate / methacrylic acid 5-oxo-4-oxatricyclo[4.2.1.0 3.7]nonane-2-yl

CAS254900-07-7

MF

Purity99%

ClassificationPhotoresist - Acrylate Monomers
2-Propenoic acid, 2-methyl-, 3-[(2,2,2-trifluoroacetyl)oxy]tricyclo[3.3.1.13,7]dec-1-yl ester

CAS1151809-20-9

MF

Purity99%

ClassificationPhotoresist - Acrylate Monomers
5-Oxo-tetrahydrofuran-3-yl methacrylate / beta-Methacryloyloxy-gamma-butyrolactone

CAS130224-95-2

MF

Purity99%

ClassificationPhotoresist - Acrylate Monomers
2-Propenoic acid, 2-methyl-, 1-phenylcyclopentyl este

CAS1227868-40-7

MF

Purity99%

ClassificationPhotoresist - Acrylate Monomers
1-Isopropylcyclopentanol

CAS1462-05-1

MF

Purity99%

ClassificationPhotoresist - Acrylate Monomers
Methacrylic acid (2-phenyl-2-propyl) ester

CAS54554-17-5

MF

Purity99%

ClassificationPhotoresist - Acrylate Monomers
triphenylsulfonium 2-(1-adamantanecarbonyloxy)-1,1,3,3,3-pentafluoropropanesulfonate

CAS911683-93-7

MF

Purity99%

ClassificationPhoto-Acid Generator
triphenylsulfonium 2-(adamantan-1-ylcarbonyloxy)-3,3,3-trifluoropropane-1-sulfonate

CAS1451961-31-1

MF

Purity99%

ClassificationPhoto-Acid Generator
bis(4-tert-butylphenyl)-{4-(1,1,3,3,3-pentafluoro-1-sulfonatopropan-2-yloxy)phenyl}-sulfonium

CAS1465790-38-8

MF

Purity99%

ClassificationPhoto-Acid Generator
benzyltrimethylammonium 1,1,3,3,3-pentafluoro-2-hydroxypropane-1-sulfonate

CAS1373617-52-7

MF

Purity99%

ClassificationPhoto-Acid Generator

Shanghai Materials Electronics Co.,Ltd. was officially established in 2021, with its headquarters located at No. 62, Lane 1515, Yuandong Road, Fengxian District, Shanghai.

POPULAR PRODUCTS: Basic raw material products; Semiconductor materials; Liquid crystal small molecule; Liquid crystal polymer; Other items

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