Photoresist - Acrylate Monomers-Shanghai Materials Electronics Co.,Ltd.

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1-isopropylcyclopentyl methacrylate

CAS1149760-04-2

MF

Purity99%

ClassificationPhotoresist - Acrylate Monomers
1-ethylcyclopentyl methacrylate

CAS266308-58-1

MF

Purity99%

ClassificationPhotoresist - Acrylate Monomers
1-Ethyl-1-cyclohexyl acrylate

CAS251909-25-8

MF

Purity99%

ClassificationPhotoresist - Acrylate Monomers
3-hydroxy-1-adamantyl methacrylate

CAS115372-36-6

MF

Purity99%

ClassificationPhotoresist - Acrylate Monomers
1-Adamantylacrylate

CAS 121601-93-2

MF

Purity99%

ClassificationPhotoresist - Acrylate Monomers
1-Adamantyl Methacrylate

CAS16887-36-8

MF

Purity99%

ClassificationPhotoresist - Acrylate Monomers
2-Oxo-2-[(5-oxo-4-oxatricyclo[4.2.1.0³,⁷]nonan-2-yl)oxy]ethyl methacrylate / 2-carboxy-4-norbornylidene-5-acetoxymethacrylate

CAS347886-81-1

MF

Purity99%

ClassificationPhotoresist - Acrylate Monomers
2-Oxotetrahydrofuran-3-yl Methacrylate

CAS195000-66-9

MF

Purity99%

ClassificationPhotoresist - Acrylate Monomers
2-Methyl-2-adamantyl methacrylate

CAS177080-67-0

MF

Purity99%

ClassificationPhotoresist - Acrylate Monomers
2-Oxo-6-hydro-2H-3,5-methylcyclopenta[b]furan-6-methacrylate / methacrylic acid 5-oxo-4-oxatricyclo[4.2.1.0 3.7]nonane-2-yl

CAS254900-07-7

MF

Purity99%

ClassificationPhotoresist - Acrylate Monomers
2-Propenoic acid, 2-methyl-, 3-[(2,2,2-trifluoroacetyl)oxy]tricyclo[3.3.1.13,7]dec-1-yl ester

CAS1151809-20-9

MF

Purity99%

ClassificationPhotoresist - Acrylate Monomers
5-Oxo-tetrahydrofuran-3-yl methacrylate / beta-Methacryloyloxy-gamma-butyrolactone

CAS130224-95-2

MF

Purity99%

ClassificationPhotoresist - Acrylate Monomers

Shanghai Materials Electronics Co.,Ltd. was officially established in 2021, with its headquarters located at No. 62, Lane 1515, Yuandong Road, Fengxian District, Shanghai.

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